Publications

The H-terminated surface of diamond when activated with NO2 produces a surface conduction layer that has been used to make FETs. Variations in processing can significantly affect this conduction layer. This article discusses the effect of diamond surface preparation and H termination procedures on surface conduction. Surface preparations that generate...

Two scanning electron beam lithography (SEBL) patterning processes have been developed, one positive and one negative tone. The processes feature nanometer-scale resolution, chemical amplification for faster throughput, long film life under vacuum, and sufficient etch resistance to enable patterning of a variety of materials with a metal-free (CMOS/MEMS compatible) tool...

The creation of millimeter wave, 3D-printable dielectric nanocomposite is demonstrated. Alumina nanoparticles were combined with styrenic block copolymers and solvent to create shear thinning, viscoelastic inks that are printable at room temperature. Particle loadings of up to 41 vol % were achieved. Upon being dried, the highest-performing of these materials...

Direct-write printing allows the fabrication of centimeter-wave radio devices. Most polymer dielectric polymer materials become lossy at frequencies above 10 GHz. Presented here is a printable dielectric material with low loss in the K a band (26.5–40 GHz). This process allows the fabrication of resonator filter devices and a radio...

The authors report on the development of surfaces containing artificially fabricated structures of dual nanometer and micrometer surfaces that allow an aqueous droplet to be reversibly switched by electrowetting from a Cassie state with low adhesion to a Wenzel state with high adhesion. A variety of geometries were fabricated to...

The ability to reversibly switch between a hydrophobic Cassie state and a hydrophilic Wenzel state is often not possible on textured surfaces because of energy barriers which result from the geometry of the microstructure. In this paper, we report on a simple microstructure geometry that allows an aqueous droplet to...

The directed assembly of polystyrene-block-poly(methyl methacrylate) films on a variety of photolytically nanopatterned siloxane-modified surfaces was investigated. The amount of siloxane removal is related to the exposure dose of a 157 nm laser. The modified surfaces were imaged using a 157 nm interference exposure system to lithographically define areas of...

We have measured the acid generation efficiency with EUV exposure of a PAG in different polymer matrixes representing the main classes of resist polymers as well as some previously described fluoropolymers for lithographic applications. The polymer matrix was found to have a significant effect on the acid generation efficiency of...

The authors have developed an atomic-force-microscopy-based technique to measure intrinsic material roughness after base development. This method involves performing an interrupted development of the resist film and measuring the resulting film roughness after a certain fixed film loss. Employing this technique, the authors previously established that the photoacid generator (PAG)...

Liquid immersion interference lithography at 157 nm has been used to print gratings of 27 nm half pitch with a fluorine-doped fused silica prism having index of 1.66. In order to achieve these dimensions, new immersion fluids have been designed and synthesized. These are partially fluorinated organosiloxanes with indexes up...