FDSOI process technology for subthreshold-operation ultralow-power electronics
February 1, 2010
Journal Article
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Published in:
Proc. of the IEEE, Vol. 98, No. 2, February 2010, pp. 333-342.
R&D Area:
Summary
Ultralow-power electronics will expand the technological capability of handheld and wireless devices by dramatically improving battery life and portability. In addition to innovative low-power design techniques, a complementary process technology is required to enable the highest performance devices possible while maintaining extremely low power consumption. Transistors optimized for subthreshold operation at 0.3 V may achieve a 97% reduction in switching energy compared to conventional transistors. The process technology described in this article takes advantage of the capacitance and performance benefits of thin-body silicon-oninsulator devices, combined with a workfunction engineered mid-gap metal gate.