Photoresist outgassing: a potential Achilles heel for short wavelength optical lithography?
February 22, 2004
Conference Paper
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Published in:
SPIE Vol. 5376, Advances in Resist Technology and Processing XXI, 22-27 February 2004, pp. 1-15.
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Summary
The outgassing of volatile organic compounds during photoresist exposure at short wavelengths (